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簡(jiǎn)要描述：Newly acquired ion implantation accelerator unit allows 2Dsemiconductors USA to create desired amounts of defects by alpha particle irradiation process at select amount of doses.
更新時(shí)間：2024-06-03產(chǎn)品型號(hào)： 廠(chǎng)商性質(zhì)：生產(chǎn)廠(chǎng)家訪(fǎng) 問(wèn) 量：1195詳細(xì)介紹
Newly acquired ion implantation accelerator unit allows 2Dsemiconductors USA to create desired amounts of defects by alpha particle irradiation process at select amount of doses. Please contact us for details and pricing.
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