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An economical solution to h-BN exfoliation. h-BN flakes powders come in large quantities (see images), and can be exfoliated onto arbitrary substrates on multiple occations (+10000 times)

Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

Multilayer h-BN (Boron Nitride) film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

This product contains h-BN mono- and few-layer flakes solution in ethanol. The h-BN solution has been developed by ultrasonic treatment of h-BN high quality crystals synthesized through cubic anvil

尺寸：5*10cm 厚度：1.6mm 銅基六方氮化硼薄膜采用化學(xué)氣相沉積法（CVD），在高純銅箔上沉積單層和多層h-BN薄膜。